Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography

Utility Patent Grant (B2)

January 30, 2018

Source: USPTO via Sqoop

Assignees: The University of North Carolina at Chapel Hill

Inventors: Joseph M. DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E. Dennis, Edward T. Samulski, R. Jude Samulski

The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.